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Home> Products> High Temperature Graphitising Furnace> Vertical High Temperature Graphitising Furnace> PI film high temperature graphitization furnace
PI film high temperature graphitization furnace
PI film high temperature graphitization furnace
PI film high temperature graphitization furnace
PI film high temperature graphitization furnace
PI film high temperature graphitization furnace

PI film high temperature graphitization furnace

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The vertical High Temperature Graphitization Furnace is mainly used for the sintering and graphitization of carbon materials such as PI film graphitization, graphene graphitization, negative electrode material graphitization, carbon carbon, and carbon ceramic composite materials. It can also be used for sintering of special ceramics and powder metallurgy. High temperature sintering and graphitization of materials and other products.
Our vertical graphitization furnace is often used in ultra-high temperature furnaces within 3000°C. It is used for the carbonization and graphitization of various high thermal conductivity graphite films (PI films), lithium battery anode materials, carbon materials, and graphitization production of carbon materials. Graphitization; shaped graphitization of carbon fiber filaments and other materials that can be sintered in a carbon environment.

Product Parameter

Vertical high temperature graphitising furnace

High Temperature Graphitising Furnace Product Characteristics

-??Industrial Electric Furnace 3000℃, common temperature is 2900℃.
-??the working atmosphere: vacuum replacement Ar2, N2 protection (micro-positive pressure)
-??temperature measurement: far-infrared optical temperature measurement temperature range 1000 ~ 3000 ℃ or 0 ~ 3000 ℃; temperature accuracy: 0.2 ~ 0.75%.
-??temperature control: programme control and manual control; temperature control accuracy: ± 1 ℃
-??Equipment adopts medium frequency power induction heating, high efficiency: unique furnace chamber design, greatly improving the furnace temperature uniformity. Limit heating speed: 200 ℃ / min (empty furnace, depending on the volume of the high-temperature zone and furnace structure) furnace temperature uniformity
-??sex ± 10 ℃, temperature control accuracy ± 1 ℃.
-???low energy consumption: thickened alumina insulation material, heat insulation and refractory effect, heat loss is small, fast heating speed.
-??Long service life of wearing parts: the bottom of crucible is padded with high-strength hard composite felt to ensure that the graphite crucible is flat and uniformly stressed at high temperature, which is 1.2 times of the service life of similar products.

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Home> Products> High Temperature Graphitising Furnace> Vertical High Temperature Graphitising Furnace> PI film high temperature graphitization furnace
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